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Obducat AB

Obducat NIL systems are equipped with a full area imprint capability, using the patented Soft Press technology, which has proven to enable replication of nanostructures down to 20 nm, with very thin and uniform residual layers on a variety of different substrates such as silicon, sapphire, GaN and flexible substrates. Obducat NIL technology enables both thermal NIL and UV-NIL as well as the unique and patented Simultaneous Thermal and UV (STUĀ®) NIL process. In addition, Obducat has developed and patented the Intermediate Polymer Stamp (IPSĀ®) technology, where a master stamp is replicated onto a soft polymer, which is then used to make the final imprint on a target substrate. This technology enables a high yield level and a significantly longer master stamp lifetime compared to the direct imprint.

Contributing Persons:
Responsible: Dr. Kristian Thulin
Dr. Ye Zhou Persson

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